Passive Silicon Photonics Fabrication Course 2017

at University of Ottawa, Ottawa, Ontario

CMC provides this training in partnership with the NSERC CREATE Silicon Electronic-Photonic Integrated Circuits Si-EPIC Program.

This course provides training in the design, fabrication, and test of photonic integrated circuits (PICs) targeting the ime SiPhotonics passives technology, available through CMC Microsystems.

This training can be integrated with your research or as a stand-alone learning opportunity. Target applications include Optical Communications and Sensors.

Mentor Graphics and Lumerical Solutions Inc. are supporting this course by providing preferred access arrangements to their tools for participants enrolled in this course.

Important:

  1. To obtain access to confidential technology information provided during the course, your organization is required to sign a Non-Disclosure Agreement (NDA) with CMC. Participants should contact Kim Sandaluk (Kim.Sandaluk@cmc.ca) to facilitate the NDA execution process prior to April 24, 2017.
  2. Because course participants will have access to other proprietary and confidential information during the course, each participant is required to sign an Access to Intellectual Property & Non-Disclosure Agreement. Participants should submit a signed agreement to Sarah Neville (Sarah.Neville@cmc.ca) prior to April 24, 2017.
  3. This course is a prerequisite for the Active Silicon Photonics Fabrication Course, in which students learn how to use a more advanced silicon photonics technology that integrates both active and passive devices. Even if your interest is primarily in active devices, please enroll in the passives course first to ensure that you complete the prerequisites for the more advanced actives course.

Registration

Registration for the Passive Silicon Photonics course is now open with the following options. To register, please click on the Registration button below.

Option Option 1 Option 2 Option 3 Option 4
Description A six-credit graduate course in the fundamentals of passive silicon photonics device and circuit design, fabrication and testing, beginning with a five-day lecture followed by a six-day hands-on workshop & seminar at the University of Ottawa. A year-long training in the fundamentals of passive silicon photonics device and circuit design, fabrication and testing, beginning with a six-day hands-on workshop & seminar at the University of Ottawa.


Workshop-only option: six-day hands-on workshop and seminar at the University of Ottawa, including access to CAD tools during the workshop and for two weeks following the workshop. Fabrication not included.
Dates
  • Lecture: May 1 to 5, 2017
  • Hands-on workshop & seminar: May 7 to 12, 2017
Location Room STE 0130
Building SITE
800 King Edward
Ottawa, Ontario
Price
  • CDN $750 discounted fabrication fee (see Eligibility and Special Notes below).
  • Registration fee includes chip fabrication area on a shared fabrication run.
  • Preferred pricing: CDN $1,350 tuition and fabrication fee (see Eligibility and Special Notes below)
  • Standard Pricing: CDN $5,500 tuition and fabrication fee
  • Registration fee includes chip fabrication area on a shared fabrication run.
CDN $3,000 tuition-only fee
Eligibility
  • Requires course registration for one of the following (see Special Notes):
  • Your faculty supervisor must sign off the design report and mask layout before your design can proceed to fabrication.
  • This pricing option is available only to researchers in Canada who have (or whose supervisor has) a Prototyping Subscription with CMC.
  • Your faculty supervisor must sign off the design report and mask layout before your design can proceed to fabrication.

This pricing option is available for any researcher that is not eligible for Options 1 and 2.
Special Notes
  1. Visiting students from institutions noted in Appendix A may register for UBC EECE 584 at no cost.
  2. Students from Quebec universities may register for Laval GEL 7070 and GEL 7071 at no cost if they register through CREPUQ.
  3. Visiting students are eligible to apply for financial assistance towards travel and accommodation costs through SiEPIC scholar program.

Prototyping subscribers and their students are also eligible to apply for Financial Assistance towards travel and accommodation costs (see more on getting a Subscription).

 
Registration




Training Schedule

  • Lecture at the University of Ottawa: May 1 to 5, 2017
  • Workshop & seminar at the University of Ottawa: May 7 to 12, 2017  
  • Design and modeling – May and June 2017
  • Design proposal deadline: July 3, 2017
  • Mask layout – July and August 2017
    • Access to software tools, tutorials, on-line discussion forums
    • design feedback provided
  • Design proposal review – August 28, 2017 (for students benefitting from discounted pricing, your faculty supervisor’s sign-off on the design report and mask layout is required before your design can proceed to fabrication)
  • Design mask layout submission: September 25, 2017
  • Device shipment date: January 2017
  • Device testing and model validation: February to April, 2018
    • Testing resources available at UBC or from CMC, if required

Technology Description

  • Silicon-on-insulator, 220-nm top Si film, 2000-nm buried oxide (BOX)
  • 193-nm deep UV lithography, enabling features down to approximately 120 nm
  • Supports design and fabrication of a range of PICs including:
    • photonic crystals
    • waveguides (photonic crystal or ridge)
    • gratings for fiber coupling
    • multiplexers (diffraction or arrayed waveguide)
    • ring resonators
    • filters
  • Fabrication is carried out at ime in Singapore.

Course Details

Option Option 1

Options 2, 3 and 4

Prerequisites
Enrolled in a graduate degree program at a Canadian university
Course(s) at the senior undergraduate or graduate level on optics, waveguides, lasers, etc.
Instruction and workshop Syllabus Summary

  • Theory of optical wave propagation, waveguides, couplers, resonators
  • Modeling of passive nanophotonic devices (e.g. waveguides, couplers, ring resonators, photonic crystals) using Matlab & Lumerical MODE, FDTD, and INTERCONNECT
  • Mask design and layout using Mentor Graphics Pyxis
  • Design considerations for SOI process
  • Modeling of passive nanophotonic devices (e.g. waveguides, couplers, ring resonators, photonic crystals) using Matlab & Lumerical MODE, FDTD, and INTERCONNECT
  • Mask design and layout using Mentor Graphics Pyxis
  • Design considerations for SOI process


Equipment Requirement

A laptop computer with the following features is required for on-site training:

  • Operating system: Windows, Mac OSX, or Linux.
  • Administrator access on laptop required to install software.
  • Wireless internet.
  • three-button mouse.
  • We will use commercial Linux-based EDA (electronic design automation) tools for layout and verification; these will be accessed via remote desktop to Linux servers.
  • We recommend a relatively new computer (< 3 years old) so that the modelling software runs quickly.
  • We also recommend bringing your own license of Matlab, Octave or other mathematical modeling software.
  • Rental or loan of a computer can be arranged if necessary.

Access to Tools

  • From Mentor Graphics:
    • Mentor Graphics offers workshop attendees free access to Pyxis and Calibre:
      • During the workshop
      • Following the workshop, for the purpose of completing their course designs.
  • From Lumerical Solutions Inc.:
    • Lumerical offers all workshop attendees free access to their CAD tools (MODE Solutions, FDTD Solutions, and INTERCONNECT) for one month. 
    • After the first month, Lumerical makes short-term licenses available to workshop attendees in support of post-workshop objectives, under the following terms:
      • For participants from educational institutions: Participants that are full-time students or faculty members at accredited, degree-granting educational institutions can make a one-time request for an additional free three-month license for each applicable Lumerical product. Academic participants who have already requested their free three-month license may purchase short-term licenses to support post-workshop objectives.
      • All other participants: May purchase short-term licenses to support post-workshop objectives.
    • Post-workshop licenses are to be purchased through CMC.

Accommodation

Hotel University of Ottawa Residences
Address 90 University Private
Ottawa, ON
Rate One-bedroom Suite: $110.00 cdn per night
Booking method
Booking group name CMC Silicon Photonics Workshop
Reservation Number CMC2017
Booking cut-off date April 18, 2017

 

Cancellations

Course cancellations must be received in writing at least one (1) week before the beginning date of the course in question to receive a full refund of the registration fee. A cancellation made after the deadline will not receive a refund. CMC Microsystems makes no commitments on refunds for travel or accommodations.

Contact

If you have any comments or questions regarding the course content or registration, please contact Jessica Zhang at zhang@cmc.ca.

Appendix A

Visiting students from the following universities have their UBC tuition fees waived:

Under the Western Dean’s Agreement:

Alberta, Athabasca, Brandon, British Columbia, British Columbia Institute of Technology, Calgary, Concordia University College of Alberta (different from the Concordia University at Montreal, PQ), Lethbridge, Manitoba, Northern British Columbia, Regina, Royal Roads University, Saskatchewan, Simon Fraser, and Victoria

Under the Graduate Exchange Agreement:

McGill University, University of Toronto, Université de Montréal