In response to COVID-19 Pandemic, CMC and our partner professors from UBC and Laval are offering this legendary Silicon photonics course online.
This course trains students in the design, fabrication, and test of photonic integrated circuits (PICs) targeting the AMF Si Photonics technology, available through CMC Microsystems, and the NanoSOI Si Photonics technology, available directly through Applied Nanotools or through SiEPICfab.
This course can be a stand-alone learning opportunity or combined with your research and/or development. Target applications include optical communications and sensors.
Siemens and Lumerical (now part of the Ansys family) are supporting this course by providing access arrangements to their tools for participants inside of Canada (more information below).
Important Notes:
- To obtain access to confidential technology information provided during the course, your organization is required to sign a Non-Disclosure Agreement (NDA) with CMC Microsystems. Please contact Jennifer Draper (Jennifer.Draper@cmc.ca) to facilitate the NDA execution process prior to May 3, 2021.
- Because course participants will have access to other proprietary and confidential information during the course, each participant is required to sign an Access to Intellectual Property & Non-Disclosure Agreement. Participants should submit a signed agreement to Sarah Neville (Neville@cmc.ca) prior to May 10, 2021.
Pre-requisites
Completion of the Passive Silicon Nanophotonic course, experience with PIC design, or permission from the instructors.
Schedule
| Date | Time | Location |
|---|---|---|
| May 17 to 28, 2021 | 11:00 am to 2:00 pm EDT | Video Conference call via Zoom |
Pricing and Registration
| Option | Option 1 | Option 2 | Option 3 | Option 4 |
|---|---|---|---|---|
| Description | A three-credit graduate course in the fundamentals of active silicon photonics device and circuit design, fabrication, and testing. | A year-long training in the fundamentals of active silicon photonics device and circuit design, fabrication, and testing. | A year-long training in the fundamentals of active silicon photonics device and circuit design, fabrication, and testing. | Workshop-only
|
| Price | $750 discounted fabrication fee; the registration fee includes chip fabrication area on a shared AMF fabrication run. | Preferred pricing: $1,150 tuition and fabrication fee; the registration fee includes chip fabrication area on a shared AMF fabrication run. | Standard pricing including tuition and fabrication fee:
Registration fee includes chip fabrication area on a shared AMF fabrication run. | Standard pricing for tuition-only fee:
|
| Eligibility | This pricing option requires course registration for one of the following (see Special Notes):
| This price option is available only to Canadian academics who have (or whose supervisor has) a subscription with CMC. | These pricing options are available for any researcher that is not eligible for Options 1 and 2. | |
| Special Notes |
| |||
| Registration | The class is full and the registration is closed. | |||
| Note: A discount is available on options 3 and 4 for multiple participants from the same organization. Contact Jessica Zhang at zhang@cmc.ca for details. | ||||
Training Schedule
- On-line pre-recorded video lectures, tutorials, and activities (passives, introduction to actives): After registration to preferably before May 17, 2021
- On-line Actives course: May 17 to 28, 2021
- On-line pre-recorded video lectures, tutorials, and activities: Starting from May 17, 2021, self-paced study
- Design, modelling, and mask layout: June to October 2021
- Access to software tools, tutorials, and online discussion forums
- Design feedback provided
- Design proposal deadline: September 20, 2021
- Design review: October 5, 2021 (for students benefiting from discounted pricing, your faculty supervisor’s sign-off on the design report and mask layout is required before your design can proceed to fabrication)
- Design submission (layout deadline): October 11, 2021
- Device shipment date: April 2022
- Device testing and model validation: May and June 2022
- Final report: July 2022
Technology Description
AMF Technology
- Silicon-on-insulator, 220-nm top Si film, 3000-nm buried oxide (BOX)
- 193-nm deep UV lithography, enabling features down to 150 nm
- Supports design and fabrication of a range of components and systems consisting of:
- modulators
- detectors
- waveguides (strip or ridge)
- gratings for fibre coupling
- deep trench and nano-tapers for edge coupling
- multiplexers (diffraction or arrayed waveguide) and filters (resonators, Bragg gratings)
- ring and disk resonators
- Fabrication is carried out at AMF in Singapore.
ANT Technology
- Silicon-on-insulator, 220-nm top Si film, 2000-nm buried oxide (BOX)
- Electron beam lithography, enabling features down to 60 nm
- Supports:
- waveguides (strip)
- gratings for fibre coupling
- metal heaters for thermo-optic phase shifting
- deep trench and nano-tapers for edge coupling
- multiplexers, filters, ring and disk resonators
- Fabrication is carried out by Applied Nanotools in Canada
- Other capabilities such as edge couplers, oxide window openings and thermal isolation trenches are available outside of the course through Applied Nanotools.
Course Details
Instruction Syllabus Summary
- Fabrication processes and design kits
- Device modelling (detectors, modulators, rings, MZI, PN & PIN junctions, thermal tuning, optical components, microwave design of electrodes)
- CAD tools: Lumerical MODE Solutions, FDTD Solutions, INTERCONNECT and DEVICE
- Layout & verification
- CAD tools: K-layout, Siemens Tanner and Calibre
- Design for Test and design for fabrication
Access to Tools
- From Siemens:
- Siemens offers workshop attendees from academic institutions free access to Tanner and Calibre during the workshop and following the workshop, for the purpose of completing their course designs. Condition on access regions may apply.
- From Ansys Lumerical:
- UBC offers workshop attendees inside of Canada free access to Lumerical teaching license of MODE Solutions, FDTD Solutions, INTERCONNECT and DEVICE during the workshop and following the workshop for the purpose of completing their course designs.
- International participants must be self-licensed to the Ansys Luermical tools.
Contact
If you have any comments or questions regarding the course content or registration, please contact Jessica Zhang at zhang@cmc.ca.
Cancellations
Course cancellations must be received in writing at least one (1) week before the beginning date of the course in question to receive a full refund of the registration fee. A cancellation made after the deadline will not receive a refund. CMC Microsystems makes no commitments on refunds for travel or accommodations.
Appendix A
Students enrolled in graduate programs at other Canadian universities may enroll in the UBC course as a visiting student. Application to UBC graduate school is required. Conditions may apply. Details can be found at:
https://www.grad.ubc.ca/prospective-students/application-admission/visitors-canadian-universities