Passive Silicon Photonics Fabrication Course 2018

at University of British Columbia, Vancouver, BC

Building on the success of the NSERC SiEPIC program, CMC provides this training in partnership with the UBC.

This course trains students in the design, fabrication, and test of photonic integrated circuits (PICs) using the advanced Si photonics design automation platform targeting the AMF SiPhotonics passives technology, available through CMC Microsystems.

This training can be integrated with your research or as a stand-alone learning opportunity. Target applications include Optical Communications and Sensors.

Mentor Graphics, Lumerical Solutions Inc. and Luceda Photonics are supporting this course by providing preferred access arrangements to their tools for participants enrolled in this course.

Important:
  1. To obtain access to confidential technology information provided during the course, your organization is required to sign a Non-Disclosure Agreement (NDA) with CMC. Participants should contact Kim Sandaluk (Kim.Sandaluk@cmc.ca) to facilitate the NDA execution process prior to July 23, 2018.
  2. Because course participants will have access to other proprietary and confidential information during the course, each participant is required to sign an Access to Intellectual Property & Non-Disclosure Agreement. Participants must submit a signed agreement to Sarah Neville (Sarah.Neville@cmc.ca) prior to July 31, 2018.
  3. This course is a prerequisite for the Active Silicon Photonics Fabrication Course, in which students learn how to use a more advanced silicon photonics technology that integrates both active and passive devices. Even if your interest is primarily in active devices, please enroll in the passives course first to ensure that you complete the prerequisites for the more advanced actives course.

Note: This course and the CMC-UBC Actives Silicon Photonics Workshop are being offered concurrently in August. Individuals are only permitted to register for one course during the August 2018 session.

Schedule

Content Date Time Location
Lecture August 6 to 10
9:00 am to 5:00 pm
Fred Kaiser Building Rm 2020
2332 Main Mall
Vancouver, BC V6T 1Z4
Workshop August 12 to 18
9:00 am to 6:00 pm
Fred Kaiser Building Rm 2020
2332 Main Mall
Vancouver, BC V6T 1Z4

Registration

Registration for the Passive Silicon Photonics course is now open with the following options. To register, please click the registration button below.

Option Option 1 Option 2 Option 3 Option 4
Description A six-credit graduate course in the fundamentals of passive silicon photonics device and circuit design, fabrication and testing, beginning with five days of lectures and followed by a seven-day hands-on workshop & seminar at UBC. A year-long training in the fundamentals of passive silicon photonics device and circuit design, fabrication and testing, beginning with a seven-day hands-on workshop & seminar at UBC. Workshop-only option: Seven-day hands-on workshop and seminar at UBC, including access to CAD tools during the workshop and for two weeks following the workshop. Fabrication not included.
Price
  • $750 discounted fabrication fee (see Eligibility and Special Notes below).
  • Registration fee includes chip fabrication area on a shared fabrication run.
  • Preferred pricing: $1,350 tuition and fabrication fee (see Eligibility and Special Notes below)
  • Registration fee includes chip fabrication area on a shared fabrication run.
  • Standard pricing including tuition and fabrication fee:
    • Industry: $5,500
    • Academic: $3,500
  • Registration fee includes chip fabrication area on a shared fabrication run.
  • For Option 3 only: Discount available to companies registering multiple attendees for training. Contact us for details.
Standard pricing for tuition-only fee:
  • Industry: $3,000
  • Academic: $1,750
Eligibility This pricing option requires course registration for one of the following (see Special Notes):
  • UBC EECE 571Q (3 credits, one semester, design-only), or
  • Communication Systems (4 credits, two semesters, design and test)
This price option is available only to Canadian academics who have (or whose supervisor has) a Prototyping level subscription with CMC.
These pricing option are available for any researcher that is not eligible for Options 1 and 2. These pricing option are available for any researcher that is not eligible for Options 1 and 2.
Special Notes
  1. Visiting students from institutions noted in Appendix A may register for UBC EECE 571Q.

Prototyping subscribers and their students are also eligible to apply for Financial Assistance towards travel and accommodation costs (see more on getting a Subscription).


Registration

Training Schedule

  • Lecture at UBC: August 6 to 10, 2018
  • Workshop & seminar at UBC: August 12 to 18, 2018  
  • Design and modeling – August and September 2018
  • Design proposal deadline: September 24, 2018
  • Mask layout – October 2018
    • Access to software tools, tutorials, on-line discussion forums
    • Design feedback provided
  • Design mask layout submission: October 22, 2018
  • Device shipment date: May 31, 2019
  • Device testing and model validation: June to August, 2019
    • Testing resources are available from UBC or from CMC, if required.

Technology Description

  • Silicon-on-insulator, 220-nm top Si film, 2000-nm buried oxide (BOX)
  • 193-nm deep UV lithography on Si etching layers, enabling features down to approximately 150 nm
  • Supports design and fabrication of a range of PICs including:
    • photonic crystals
    • waveguides (photonic crystal or ridge)
    • gratings for fiber coupling
    • multiplexers (diffraction or arrayed waveguide)
    • ring resonators
    • filters
  • Fabrication is carried out at AMF in Singapore.

Course Details

Option Option 1

Options 2, 3 and 4

Prerequisites
Enrolled in a graduate degree program at a Canadian university
Course(s) at the senior undergraduate or graduate level on photonics, optical communications, electronics, etc.
Instruction and workshop Syllabus Summary

  • Theory of optical wave propagation, waveguides, couplers, resonators
  • Modeling of passive nanophotonic devices (e.g. waveguides, couplers, ring resonators, photonic crystals) using Matlab & Lumerical MODE, FDTD, and INTERCONNECT
  • Mask design and layout using Mentor Graphics Tanner
  • Design considerations for AMF passive SOI process
  • Modeling of passive nanophotonic devices (e.g. waveguides, couplers, ring resonators, photonic crystals) using Matlab & Lumerical MODE, FDTD, and INTERCONNECT
  • Mask design and layout using Mentor Graphics Tanner
  • Design considerations for AMF passive SOI process


Equipment Requirement

A laptop computer with the following features is required for on-site training:

  • 64-bit computer is required, 32-bit computer does NOT work.
  • Operating system: 64-bit Windows 7, 8.1 and 10 only, no Mac or OSX.
  • Minimum of 2 GB of RAM is required, 4 GB or more is recommended.
  • Free disk space must be more than 4 Gbits.
  • Administrator access on laptop required to install software.
  • Wireless internet.
  • Three-button mouse.
  • We will use commercial Linux-based EDA (electronic design automation) tools for layout and verification; these will be accessed via remote desktop to Linux servers.
  • We recommend a relatively new computer (< 3 years old) so that the modelling software runs quickly.
  • We also recommend bringing your own license of Matlab, Octave or other mathematical modeling software.

Access to Tools

  • From Mentor Graphics:
    • Mentor Graphics offers workshop attendees free access to Tanner and Calibre:
      • During the workshop
      • Following the workshop, for the purpose of completing their course designs.
  • From Lumerical Solutions Inc.:
    • Lumerical offers all workshop attendees free access to their CAD tools (MODE Solutions, FDTD Solutions, and INTERCONNECT) for one month. 
    • After the first month, Lumerical makes short-term licenses available to workshop attendees in support of post-workshop objectives, under the following terms:
      • For participants from educational institutions: Participants who are full-time students or faculty members at accredited, degree-granting educational institutions can make a one-time request for an additional free three-month license for each applicable Lumerical product. Academic participants who have already requested their free three-month license may purchase short-term licenses to support post-workshop objectives.
      • All other participants: May purchase short-term licenses to support post-workshop objectives.
    • Post-workshop licenses are to be purchased through CMC.

Accommodation

Recommended Hotels:

Cancellations

Course cancellations must be received in writing at least one (1) week before the beginning date of the course in question to receive a full refund of the registration fee. A cancellation made after the deadline will not receive a refund. CMC Microsystems makes no commitments on refunds for travel or accommodations.

Contact

If you have any comments or questions regarding the course content or registration, please contact Jessica Zhang at zhang@cmc.ca.

Appendix A

Visiting students from the following universities have their UBC tuition fees waived:

Under the Western Dean’s Agreement:

Alberta, Athabasca, Brandon, British Columbia, British Columbia Institute of Technology, Calgary, Concordia University College of Alberta (different from the Concordia University at Montreal, PQ), Lethbridge, Manitoba, Northern British Columbia, Regina, Royal Roads University, Saskatchewan, Simon Fraser, and Victoria

Under the Graduate Exchange Agreement:

McGill University, University of Toronto, Université de Montréal