Passive Silicon Photonics Fabrication Course 2016

at Université Laval, Québec, QC

CMC provides this training in partnership with the NSERC CREATE Silicon Electronic-Photonic Integrated Circuits Si-EPIC Program.

This course provides training in the design, fabrication, and test of photonic integrated circuits (PICs) targeting the ime SiPhotonics passives technology, available through CMC Microsystems.

This training can be integrated with your research or as a stand-alone learning opportunity. Target applications include Optical Communications and Sensors.

Mentor Graphics and Lumerical Solutions Inc. are supporting this course by providing preferred access arrangements to their tools for participants enrolled in this course.

Important:

  1. To obtain access to confidential technology information provided during the course, your organization is required to sign a Non-Disclosure Agreement (NDA) with CMC. Participants should contact Kim Sandaluk (Kim.Sandaluk@cmc.ca) to facilitate the NDA execution process prior to May 9, 2016.
  2. As course participants will have access to other proprietary and confidential information during the course, each participant is required to sign an Access to Intellectual Property & Non-Disclosure Agreement. Participants should submit a signed agreement to Sarah Neville (Sarah.Neville@cmc.ca) prior to May 9, 2016.
  3. This course is a prerequisite for the Active Silicon Photonics Fabrication Course, in which students learn how to use a more advanced silicon photonics technology that integrates both active and passive devices. Even if your interest is primarily in active devices, please enroll in the passives course first to ensure that you complete the prerequisites for the more advanced actives course.

Registration

Registration for the Passive Silicon Photonics course is now open with the following options. To register, please click on the Registration button below.

Option Option 1 Option 2 Option 3 Option 4
Description A six-credit graduate course in the fundamentals of passive silicon photonics device and circuit design, fabrication and testing, beginning with on-line course and reading materials followed by a six-day hands-on workshop & seminar at Laval University. A year-long training in the fundamentals of passive silicon photonics device and circuit design, fabrication and testing, beginning with a six-day hands-on workshop & seminar at Laval University.


Workshop-only option: six-day hands-on workshop and seminar at Laval University, including access to CAD tools during the workshop and for two weeks following the workshop. Fabrication not included.
Dates Hands-on workshop & seminar: May 27 to June 1, 2016
Location Auditorium in Pavilion of Optics and Photonics (COPL)
Université Laval
2375, rue de la Terrasse, local 2104
Québec, QC G1V 0A6
Price
  • CDN $750 discounted fabrication fee (see Eligibility and Special Notes below).
  • Registration fee includes chip fabrication area on a shared fabrication run.
  • Preferred pricing: CDN $1,350 tuition and fabrication fee (see Eligibility and Special Notes below)
  • Standard Pricing: CDN $5,500 tuition and fabrication fee
  • Registration fee includes chip fabrication area on a shared fabrication run.
CDN $3,000 tuition-only fee
Eligibility
  • Requires course registration for one of the following (see Special Notes):
    • UBC EECE 584 (6 credits), or
    • Laval GEL 7070 and GEL 7071 (3 credits each)
  • Your faculty supervisor must sign off the design report and mask layout before your design can proceed to fabrication.
  • This pricing option is available only to researchers in Canada who have (or whose supervisor has) a Prototyping Subscription with CMC.
  • Your faculty supervisor must sign off the design report and mask layout before your design can proceed to fabrication.

This pricing option is available for any researcher that is not eligible for Options 1 and 2.
Special Notes
  1. Visiting students from institutions noted in Appendix A may register for UBC EECE 584 at no cost.
  2. Students from Quebec universities may register for Laval GEL 7070 and GEL 7071 at no cost if they register through CREPUQ.
  3. Visiting students are eligible to apply for financial assistance towards travel and accommodation costs through SiEPIC scholar program.

Prototyping subscribers and their students are also eligible to apply for Financial Assistance towards travel and accommodation costs (see more on getting a Subscription).

 
Registration

Closed.

Training Schedule

  • Professors provide reading material and on-line course: April to May, 2016
  • Workshop & seminar at Université Laval: May 27 to June 2, 2016  
  • Design and modeling – June and July 2016
  • Design proposal deadline: July 15, 2016
  • Mask layout – July and August 2016
    • Access to software tools, tutorials, on-line discussion forums
    • design feedback provided
  • Design review – September 2016 (for students benefitting from discounted pricing, your faculty supervisor’s sign-off on the design report and mask layout is required before your design can proceed to fabrication)
  • Design submission (mask layout and design report deadline date): September 12, 2016
  • Device shipment date: February 2017
  • Device testing and model validation: February to April, 2017
    • Testing resources available at UBC or from CMC, if required

Technology Description

  • Silicon-on-insulator, 220-nm top Si film, 2000-nm buried oxide (BOX)
  • 193-nm deep UV lithography, enabling features down to approximately 120 nm
  • Supports design and fabrication of a range of PICs including:
    • photonic crystals
    • waveguides (photonic crystal or ridge)
    • gratings for fiber coupling
    • multiplexers (diffraction or arrayed waveguide)
    • ring resonators
    • filters
  • Fabrication is carried out at ime in Singapore.

Course Details

Option Option 1

Options 2, 3 and 4

Prerequisites
Enrolled in a graduate degree program at a Canadian university
Course(s) at the senior undergraduate or graduate level on optics, waveguides, lasers, etc.
Instruction and workshop Syllabus Summary

  • Theory of optical wave propagation, waveguides, couplers, resonators
  • Modeling of passive nanophotonic devices (e.g. waveguides, couplers, ring resonators, photonic crystals) using Matlab & Lumerical MODE, FDTD, and INTERCONNECT
  • Mask design and layout using Mentor Graphics Pyxis
  • Design considerations for SOI process
  • Modeling of passive nanophotonic devices (e.g. waveguides, couplers, ring resonators, photonic crystals) using Matlab & Lumerical MODE, FDTD, and INTERCONNECT
  • Mask design and layout using Mentor Graphics Pyxis
  • Design considerations for SOI process


Equipment Requirement

A laptop computer with the following features is required for on-site training:

  • Operating system: Windows, Mac OSX, or Linux.
  • Administrator access on laptop required to install software.
  • Wireless internet.
  • three-button mouse.
  • We will use commercial Linux-based EDA (electronic design automation) tools for layout and verification; these will be accessed via remote desktop to Linux servers.
  • We recommend a relatively new computer (< 3 years old) so that the modelling software runs quickly.
  • We also recommend bringing your own license of Matlab, Octave or other mathematical modeling software.
  • Rental or loan of a computer can be arranged if necessary.

Access to Tools

  • From Mentor Graphics:
    • Mentor Graphics offers workshop attendees free access to Pyxis and Calibre:
      • During the workshop
      • Following the workshop, for the purpose of completing their course designs.
  • From Lumerical Solutions Inc.:
    • Lumerical offers all workshop attendees free access to their CAD tools (MODE Solutions, FDTD Solutions, and INTERCONNECT) for one month. 
    • After the first month, Lumerical makes short-term licenses available to workshop attendees in support of post-workshop objectives, under the following terms:
      • For participants from educational institutions: Participants that are full-time students or faculty members at accredited, degree-granting educational institutions can make a one-time request for an additional free three-month license for each applicable Lumerical product. Academic participants who have already requested their free three-month license may purchase short-term licenses to support post-workshop objectives.
      • All other participants: May purchase short-term licenses to support post-workshop objectives.
    • Post-workshop licenses are to be purchased through CMC.

Accommodation

Hotel Hébergement hôtelier du Service des résidences de l’Université Laval – Laval University Student Residence
Address Pavillon Alphonse-Marie-Parent, 2255 rue de l'Université, local 1618
Québec, G1V 0A7
Rate
  • Standard University Room (shared bathroom, breakfast included):
    • $ Single occupancy: 46.50 + taxes
    • $ Double occupancy: 66.00 + taxes
  • Superior University Room (private bathroom, breakfast included) (available year round):
    • Single or double occupancy: $ 87 + taxes
Booking method
Booking group name 253302 Silicon Photonics Workshop

 

Cancellations

Course cancellations must be received in writing at least one (1) week before the beginning date of the course in question to receive a full refund of the registration fee. A cancellation made after the deadline will not receive a refund. CMC Microsystems makes no commitments on refunds for travel or accommodations.

Contact

If you have any comments or questions regarding the course content or registration, please contact Jessica Zhang at zhang@cmc.ca.

Appendix A

Visiting students from the following universities have their UBC tuition fees waived:

  • Under the Western Dean’s Agreement:

    Alberta, Athabasca, Brandon, British Columbia, British Columbia Institute of Technology, Calgary, Concordia University College of Alberta (different from the Concordia University at Montreal, PQ), Lethbridge, Manitoba, Northern British Columbia, Regina, Royal Roads University, Saskatchewan, Simon Fraser, and Victoria