Join CMC and XTPL for a demonstration of a novel ultra-precise deposition (UPD) technology for rapid prototyping of microelectronic devices. UPD allows maskless deposition of high-viscosity metallic and non-metallic inks
Join CMC and XTPL for a demonstration of a novel ultra-precise deposition (UPD) technology for rapid prototyping of microelectronic devices. UPD allows maskless deposition of high-viscosity metallic and non-metallic inks with the printed feature size as small as 1 µm. XTPL technology answers some of the key challenges in the fabrication of high-density microelectronics. It is possible to print on complex substrates and obtain structures with arbitrary shapes, including lines, dots, crosses, and meshes.
Dr Filip Granek, CEO at XTPL S.A. in Poland
Dr Filip Granek Short bio:
Co-founder and co-inventor of XTPL technology. Received his masters in electrical engineering from Wroclaw University of Technology in Wroclaw, Poland, and his Ph.D. degree in Material science from Albert Ludwigs University in Freiburg, Germany. Performed research at the international hi-tech research facilities and businesses such as Fraunhofer ISE (Germany), ECN (the Netherlands), ANU (Australia), Kingstone Semiconductor Company Ltd. (China). He supervised research in close collaboration with the enterprises from the photovoltaic and printed electronics sector in Europe, Asia, and the U.S. He received numerous awards and grants, e.g. the Burgen scholarship (Akademia Europea), the grant of the Foundation for Polish Science, the Ministry of Science and Higher Education grant for eminent young scientists, the German DAAD’s grant and the prestigious LIDER research grant from the National Centre for Research and Development. He is a member of the renowned Young Academy of Europe and he was included among top European innovators (“New Europe 100 Challengers”). Winner of the 16th edition of the EY Entrepreneur of the Year 2018 competition. He authored 70 academic publications (over 1300 citations) and is the inventor and co-inventor of 30 international patent applications and patents.
XTPL operates in the nanotechnology market segment. The company is developing and commercializing its globally innovative platform technology of ultra-precise printing of nanomaterials, protected by international patent applications. The XTPL method is a breakthrough. This is because of a unique combination of several features: it is an additive method, which ensures significant time and material savings and allows the advantages of print – such as scalability, cost-effectiveness, simplicity, and speed – to be used in the production of advanced devices thanks to unprecedented precision (structures width 1-8 micrometers) and without a need to use electric field. Due to its platform character, this solution will find application in the broadly understood printed electronics industry. XTPL WEBSITE
(Tuesday) 2:00 pm - 3:00 pm EDT