In response to COVID-19 Pandemic, CMC and its SiEPIC partner professors are offering this legendary Silicon Photonics Fabrication Course on-line.
This course trains students in the design, fabrication, and test of photonic integrated circuits (PICs) targeting the AMF Si Photonics technology, available through CMC Microsystems. It can be a stand-alone learning opportunity or combined with your research and/or development. Target applications include optical communications and sensors.
Mentor Graphics (now part of Siemens) and Lumerical (now part of the ANSYS family) are supporting this course by providing access arrangements to their tools for participants inside of Canada (more information below).
- There are restrictions regarding the country you will be in while attending the event and your citizenship. These are based on government regulations and technology suppliers. CMC and the hosts for the event must follow the restrictions. If you will not be physically situated in Canada while taking the course and/or your citizenship is not Canadian, please contact Sarah Neville (Neville@cmc.ca).
- We provide four registration options. Only academics who are currently registered with a Canadian university are eligible to register for Option 1 or 2. Students affiliated with a university outside of Canada and anyone not registered in a university are welcomed to register option 3 or 4.
- If you are registering in an Option that includes fabrication (option 1, 2 and 3), you will be required to complete two export control questionnaires:
- Controlled Status of Masks/Reticles or Imprint Lithography Templates
- Canadian Export Control Questionnaire
- To obtain access to confidential technology information provided during the course, your organization is required to sign a Non-Disclosure Agreement (NDA) with CMC Microsystems. Please contact Jennifer Draper (Draper@cmc.ca) to facilitate the NDA execution process prior to October 18, 2021.
- Course participants will have access to other proprietary and confidential information during the course, each participant is required to sign an Access to Intellectual Property & Non-Disclosure Agreement. Participants should submit a signed agreement to Sarah Neville (Neville@cmc.ca) prior to October 29, 2021.
Completion of an undergraduate program in electrical engineering or applied physics.
|Before class||At your own schedule||Pre-recorded video lectures, tutorials, and activities|
|November 1 to 12 2021||12:00 pm to 3:00 pm EST||Video Conference call via Zoom|
Pricing and Registration
The registration deadline is October 22, 2021.
|Option||Option 1 – Canadian academics for course credits||Option 2 – Canadian academics for research||Option 3||Option 4|
Canadian academics register one of the graduate courses:
|Canadian academics who have (or whose supervisor has) a subscription with CMC|
For engineers and researchers from organizations of
|Description||A three-credit graduate course in the fundamentals of silicon photonics device and circuit design, fabrication, and testing, beginning with the online workshop||A year-long training in the silicon photonics device and circuit design, fabrication, and testing, beginning with the online workshop||A year-long training in the silicon photonics device and circuit design, fabrication, and testing, beginning with the online workshop|
Workshop and recorded material. Fabrication is not included.
|Registration||Coming soon …|
- Online pre-recorded video lectures, tutorials and activities (self-paced, after registration is confirmed)
- Online Passive workshop: November 1 to 12, 2021
- Design, modelling and mask layout: November 2021 to February 2022
- Access to software tools, tutorials, and online discussion forums
- Design feedback provided
- Design proposal deadline: February 28, 2022
- Design submission (layout deadline): March 14, 2022
- Device shipment date: September 2022
- Device testing and model validation: September to November 2022
- Silicon-on-insulator, 220 nm top Si film, 2000 nm buried oxide (BOX)
- 193 nm deep UV lithography on Si etching layers, enabling features down to ~150 nm
- Supports design and fabrication of a range of PICs including:
- photonic crystals
- waveguides (photonic crystal or ridge)
- gratings for fiber coupling
- multiplexers (diffraction or arrayed waveguide)
- ring resonators
- Fabrication is carried out at AMF, Singapore
Instruction Syllabus Summary
- Photonics passive device theory and modelling.
- Fabrication processes and design kits
- Lumerical MODE Solutions, FDTD Solutions, INTERCONNECT
- Layout & verification
- CAD tools: K-layout, Mentor Graphics Tanner and Calibre
- Design for test and design for fabrication
Access to Tools
- Mentor Graphics from Siemens – Siemens offers workshop attendees from academic institutions no-cost access to Tanner and Calibre licenses during the workshop and following the workshop, for the purpose of completing their course designs. License accesses for industrial participants will be reviewed by Siemens (Mentor) on a case-by-case basis.
- ANSYS Lumerical – UBC offers workshop attendees inside of Canada no-cost access to Lumerical teaching license of MODE Solutions, FDTD Solutions, INTERCONNECT and DEVICE during the workshop and following the workshop for the purpose of completing their course designs. Participants outside of Canada must be self-licensed to the Ansys Lumerical tools.
If you have any comments or questions regarding the course content or registration, please contact Jessica Zhang.
Course cancellations must be received in writing at least one (1) week before the beginning date of the course in question to receive a full refund of the registration fee. A cancellation made after the deadline will not receive a refund. CMC Microsystems makes no commitments on refunds for travel or accommodations.