FAB

Laser-Assisted Cleaving

Four-to-six-week turnaround time for laser cleaved silicon devices

In collaboration with INO, CMC has developed a technique for laser assisted cleaving of SOI devices, and is offering this service to researchers at subsidized prices.
Close up of laser cleaving

Overview

  • The estimated turnaround time for this service is four to six weeks.
  • Processing takes place at INO.
  • Laser is used to trigger the location of cleaving.
  • The cleaving is done with an accuracy of +/-15 µm.
  • The technique provides good facet quality for end-fire coupling.
  • Thin Silicon layers are accepted (up to 5 µm).
  • For chip dimensions, see Guidelines for Laser Assisted Cleaving.
  • We recommend alignment marks on chips to indicate where the cleaving is needed.

Applications

  • Intended for use with Silicon photonics and other Silicon-based chips
  • Cleaving along vertical plane of the waveguide
  • Singulation of specific area of a chip

Pricing

Contact pricing@cmc.ca for a quote.

Access and Support

For engineering support questions and to request access, contact fab@cmc.ca.

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JAN 18 — FEB 4, 2021

Gate-based Quantum
Computing Using IBM Q

Virtual Workshop

Quantum Computing at your fingertips:

Elevate your expertise to seize tomorrow’s opportunities

CMC Planned Service Disruption

Thursday, August 6
8 am to 9 am EDT

CMC is making improvements to infrastructure that will potentially affect connectivity to CMC managed license servers.

We apologize for the inconvenience this may cause.

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