Applied Nanotools (ANT) NanoSOI Fabrication Process


  • Silicon-on-insulator, 220-nm top Si film, 2000-nm buried oxide (BOX)
  • 100 keV electron-beam lithography system enabling features down to 60 nm
  • One full etch of the top silicon for standard MPW run, partial silicon itching will be available in near future
  • Tri-layer TiW/Al metallization and TiW alloy heater are available
  • Metal oxide window, deep trench for edge coupling and SEM imaging options are available.
  • Implants for optical modulators will be available in future
  • Supports design and fabrication of a range of components and systems consisting of:
    • waveguides (strip or ridge)
    • gratings for fiber coupling
    • deep trench and nano-tapers for edge coupling
    • multiplexers (diffraction or arrayed waveguide) and filters (resonators, Bragg gratings)
    • ring and disk resonators


  • SOI, 220 nm top Si, 2000 nm BOX
  • 100 keV electron-beam lithography for waveguides
  • One metal level for routing plus metal heater
  • Future options include implants for optical modulators

Note: Every individual accessing this technology is required to read and sign a technology-specific NDA. If you have not done so, please contact Dr. Susan Xu as soon as possible to get started.

Design Kits and Libraries


Subscribers (Academics in Canada)
Subscribers (Academics in Canada, Peer Reviewed)
Academics outside of Canada or Industry

(Per 9 x 9 mm design)

(Per 9 x 9 mm design)

Contact CMC. Contact fab@cmc.ca for MPW access, or sales@cmc.ca for a dedicated run.


Contact licensing@cmc.ca.

Minimum Subscription Required: Research

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