This process allows for fabrication of coplanar structures on a high-resistivity silicon substrate, like resonators with quality factors of about one million. Aluminum junctions (Manhattan style) fabricated via electron-beam lithography can be used to make transmon qubits.
CMC offers this process as part of a multi-project wafer (MPW) service.
- Al-AlOx-Al junctions with normal-state resistance ranging from 4k to 15 kOhm
- High-resistivity silicon substrate
- Nb wiring layer
- Josephson junctions
- Low-temperature electronics
- Design kits
- Design-rule checking services
- CMC engineering support