FAB

AMS 0.35 µm CMOS Process Technology (Opto)

Description

This 0.35 μm CMOS technology offers four metal layers, digital standard cells, an anti-reflective coating and high-efficiency photodiodes, and bulk micromachining.

CMC’s multi-project wafer service delivers this technology from austriamicrosystems, offering three processes: Basic, Opto (see details below) and High-Voltage.

Opto Process (C35B4O1) Details

  • Technology Features:
    • 4 metal and 2 poly layers (similar to basic option)
    • High-efficiency photodiode and anti-reflective coating for imaging and optoelectronic detection applications
  • Supply Voltage: 3.3 V/5 V
  • Bulk-micromachining option, allowing monolithic implementation of MEMS and microelectronics

Note: The expected number of chips to be delivered for this technology is 25.

Applications

The technology is suitable for:

  • Embedded photodiodes, high-density CMOS imaging and optoelectronic detection
  • High-voltage operation (maximum 20V gate, 50V operating voltage)
  • Mixed-signal designs
  • High-speed digital circuits
  • For the Basic and Opto processes, bulk micromachining of MEMS structures

Potential applications include:

  • Biomedical imaging
  • Automotive and environmental sensors

Features

  • 3.3 V/5 V
  • 2P4M
  • anti-reflective coating

Design Kits and Libraries

Pricing

List Price
Price for Subscribers
Note: List pricing does not include Engineering Support – contact fab@cmc.ca for a quote.

Note: Discounted pricing is available to academics in Canada with a CMC Subscription. You must sign in to see it.

Licensing

Minimum Subscription Required: Research

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