AMS – CMC Microsystems

AMS 0.35 µm CMOS Process Technology (High-Voltage)

This 0.35 µm CMOS technology offers four metal layers, digital standard cells, an anti-reflective coating and high-efficiency photodiodes, and bulk micromachining. CMC’s multi-project wafer service delivers this technology from austriamicrosystems, offering three processes: Basic, Opto and High-Voltage (see details below). The technology is suitable for: High-Voltage Process (H35B4D3) Details Technology Features: 4 metal and 2 poly layers with a […]

AMS 0.35 µm CMOS Process Technology (High-Voltage) Read More »

AMS 0.35 µm CMOS Process Technology (Opto)

Technologies / By Aaron Wang

This 0.35 μm CMOS technology offers four metal layers, digital standard cells, an anti-reflective coating and high-efficiency photodiodes, and bulk micromachining. CMC’s multi-project wafer service delivers this technology from austriamicrosystems, offering three processes: Basic, Opto (see details below) and High-Voltage. Opto Process (C35B4O1) Details Technology Features: 4 metal and 2 poly layers (similar to basic option) High-efficiency

AMS 0.35 µm CMOS Process Technology (Opto) Read More »

AMS 0.35 µm CMOS Process Technology (Basic)

Technologies / By Aaron Wang

This 0.35 μm CMOS technology offers four metal layers, digital standard cells, an anti-reflective coating and high-efficiency photodiodes, and bulk micromachining. CMC’s multi-project wafer service delivers this technology from austriamicrosystems, offering three processes: Basic (see details below), Opto and High-Voltage. Basic Process (C35B4C3) Details Technology Features: 4 metal and 2 poly layers Supply Voltage: 3.3/5V Bulk-micromachining option, allowing

AMS 0.35 µm CMOS Process Technology (Basic) Read More »

AMS 0.35 µm CMOS Process Technology (High-Voltage)

AMS 0.35 µm CMOS Process Technology (Opto)

AMS 0.35 µm CMOS Process Technology (Basic)

Challenges Announcement.

FUNDING