Photonics Featured

Featured Photontonics tools and technologies on spotlight pages

AMF Silicon Photonics High-Performance Fabrication Process

AMF High-Performance technology was engineered to tackle the high-speed, ultra-low-loss demands of next-generation applications. The improved material properties and proven production stabilities deliver unmatched performance for applications demanding higher bandwidth and lower latency. Process Modules Silicon-on-insulator, 220-nm top Si film, 3000-nm buried oxide (BOX) High resistivity handle wafer (>750 ohm-cm) 193-nm deep UV lithography for […]

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GlobalFoundries® 55 nm BCDLite

CMC Microsystems offers access to the GlobalFoundries® 55 nm BCDLite (GF55BCDLite) technology, designed for applications requiring Bipolar-CMOS-DMOS (BCD) technology, such as high-performance Power Management ICs (PMICs). This process provides optimized RDS(on) for efficient power delivery and features low-power and high-voltage LDMOS transistors, making it ideal for power-sensitive designs. CMC Microsystems offers access to this technology

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GlobalFoundries® 28 SLPe

CMC Microsystems offers access to the GlobalFoundries® 28 nm Super Low Power Extended (28SLPe) technology, an ideal process for energy-efficient, mixed-signal, and RF SoC applications. The 28SLPe technology provides best-in-class power efficiency for a wide range of applications. Its optimized 28 nm planar transistor technology enables ultra-low leakage and supports high-density designs for performance and

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Keysight Technologies

Keysight Optical Solutions Group (OSG) Tools (RSOFT, Code V, and LightTools)

Keysight Optical Solutions Group software includes the following tools: RSoft Component Suite: Component design of both passive and active devices. RSoft System Tools: System simulation and design automation of photonic integrated circuits (PIC’s). Code V: Optical Design software for lens and optical system design LightTools Illumination software: Design, Optimization and analysis solution for illumination optics

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GlobalFoundries® Silicon Photonics - GF Fotonix™ (45SPCLO)

The GlobalFoundries® (GF) silicon photonics (SiPh) foundry portfolio is designed to help you deliver more data faster, farther, and more efficiently than traditional CMOS technologies. 45SPCLO, built on a 45 nm SOI platform, enables monolithic integration of RF, analog and Si-Photonic circuits with high efficiency and high data speed. CMC Microsystems offers access to GlobalFoundries technologies

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Applied Nanotools (ANT) Silicon Nitride (SiN) Fabrication Process

Silicon nitride with device layer thickness 400 nm and buffer oxide Layer thickness 4.5 µm 100 keV electron-beam lithography system enabling features down to 120 nm Fully etched devices (etched down to the buffer oxide) are created using an e-beam mask material and anisotropic ICP-RIE etching process. Tri-layer TiW/Al metallization and TiW alloy heater are available

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Applied Nanotools (ANT) NanoSOI Fabrication Process

Silicon-on-insulator, 220-nm top Si film, 2000-nm buried oxide (BOX) 100 keV electron-beam lithography system enabling features down to 60 nm One full etch of the top silicon for standard MPW run, partial silicon etching will be available in near future Tri-layer TiW/Al metallization and TiW alloy heater are available Metal oxide window, deep trench for

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Synopsys Photonic System Tools

Synopsys Photonic System Tools software includes the following tools: OptoCompiler with Custom Compiler: A unified electronic and photonics design platform for photonic IC design. OptSim: Provides comprehensive simulations of photonic ICs and optical communication systems. For more information, see the full list of Photonic Solutions Products. Licensing Requirements or Restrictions Technical Details What You Get

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GlobalFoundries® Silicon Photonics 9WG

The GlobalFoundries® (GF) silicon photonics (SiPh) foundry portfolio is designed to help you deliver more data faster, farther and more efficiently than traditional CMOS technologies. 9WG is an industry-first SiPh foundry solution. Built on a 90 nm SOI platform, the offering enables you to leverage high-volume manufacturing along with advanced processing and controls that utilize

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AMF Silicon Photonics General-Purpose Fabrication Process

Silicon-on-insulator, 220-nm top Si film, 3000-nm buried oxide (BOX) High resistivity handle wafer (>750 ohm-cm) 193-nm deep UV lithography for waveguides, enabling features down to approximately 140 nm Two partial etches and one full etch of the top silicon PECVD Silicon Nitride waveguide integration 6 implants for optical modulators (P++, P+, P, N++, N+, N) Germanium

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